发明授权
- 专利标题： Microchannel structure and its manufacturing method, light source device, and projector
- 专利标题（中）： 微通道结构及其制造方法，光源装置和投影仪
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申请号： US11332144申请日： 2006-01-17
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公开(公告)号： US08018128B2公开(公告)日： 2011-09-13
- 发明人: Akira Egawa , Satoshi Kinoshita , Kunihiko Takagi
- 申请人： Akira Egawa , Satoshi Kinoshita , Kunihiko Takagi
- 申请人地址： JP Tokyo
- 专利权人： Seiko Epson Corporation
- 当前专利权人： Seiko Epson Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Oliff & Berridge, PLC
- 优先权： JP2005-035868 20050214; JP2005-314061 20051028
- 主分类号： H01J1/58
- IPC分类号： H01J1/58 ; H01J7/26 ; H01J61/52
摘要：
A microchannel structure with a fine flow path through which a fluid flows, includes: a wavy plate member fabricated into a wavy form; an external peripheral wall member that surrounds the wavy plate member; and a spacer that ensures a spacing between opposed portions of the wavy plate member, wherein the fine flow path is defined by the wavy plate member and the external peripheral wall member.