Invention Grant
- Patent Title: Microchannel structure and its manufacturing method, light source device, and projector
- Patent Title (中): 微通道结构及其制造方法，光源装置和投影仪
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Application No.: US11332144Application Date: 2006-01-17
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Publication No.: US08018128B2Publication Date: 2011-09-13
- Inventor: Akira Egawa , Satoshi Kinoshita , Kunihiko Takagi
- Applicant: Akira Egawa , Satoshi Kinoshita , Kunihiko Takagi
- Applicant Address: JP Tokyo
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2005-035868 20050214; JP2005-314061 20051028
- Main IPC: H01J1/58
- IPC: H01J1/58 ; H01J7/26 ; H01J61/52
Abstract:
A microchannel structure with a fine flow path through which a fluid flows, includes: a wavy plate member fabricated into a wavy form; an external peripheral wall member that surrounds the wavy plate member; and a spacer that ensures a spacing between opposed portions of the wavy plate member, wherein the fine flow path is defined by the wavy plate member and the external peripheral wall member.
Public/Granted literature
- US20060180298A1 Microchannel structure and its manufacturing method, light source device, and projector Public/Granted day:2006-08-17
Information query
