Invention Grant
- Patent Title: Thermal field emission cathode
- Patent Title (中): 热场发射阴极
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Application No.: US12145036Application Date: 2008-06-24
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Publication No.: US08022609B2Publication Date: 2011-09-20
- Inventor: Zhong-Wei Chen , Juying Dou
- Applicant: Zhong-Wei Chen , Juying Dou
- Applicant Address: TW Hsinchu
- Assignee: Hermes-Microvision, Inc.
- Current Assignee: Hermes-Microvision, Inc.
- Current Assignee Address: TW Hsinchu
- Agency: Sawyer Law Group, P.C.
- Main IPC: H01J1/14
- IPC: H01J1/14 ; H01J19/08

Abstract:
A thermal field emission cathode which is employed in an electron microscope, a critical dimension examine tool, an electron beam lithograph machine, an electron beam tester and other electron beam related systems as an electron source is disclosed. Embodiments disclose changing coating shape, coating position and shorten emitter length to extend the lifetime of the field emission cathode.
Public/Granted literature
- US20090315444A1 THERMAL FIELD EMISSION CATHODE Public/Granted day:2009-12-24
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