发明授权
US08025160B2 Sulfur-impregnated organoclay mercury and/or arsenic ion removal media
有权
含硫浸渍的有机粘土汞和/或砷离子去除介质
- 专利标题: Sulfur-impregnated organoclay mercury and/or arsenic ion removal media
- 专利标题(中): 含硫浸渍的有机粘土汞和/或砷离子去除介质
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申请号: US12116405申请日: 2008-05-07
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公开(公告)号: US08025160B2公开(公告)日: 2011-09-27
- 发明人: Zhen Wang , Robert Abraham
- 申请人: Zhen Wang , Robert Abraham
- 申请人地址: US IL Hoffman Estates
- 专利权人: Amcol International Corporation
- 当前专利权人: Amcol International Corporation
- 当前专利权人地址: US IL Hoffman Estates
- 代理机构: Marshall, Gerstein & Borun LLP
- 主分类号: B01D39/02
- IPC分类号: B01D39/02
摘要:
The use of a sulfur-impregnated organoclay provides a mercury or arsenic removal media having increased reactivity, stability, and mercury removal ability. The Hg/As removal media described herein is prepared by impregnating an organophilic clay with elemental (free state) sulfur. Alternatively, the clay can be made organophilic by onium ion reaction prior to or simultaneously with impregnating the organoclay with sulfur.
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