发明授权
- 专利标题: Lithographic apparatus and device manufacturing method
- 专利标题(中): 平版印刷设备和器件制造方法
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申请号: US11390427申请日: 2006-03-28
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公开(公告)号: US08027019B2公开(公告)日: 2011-09-27
- 发明人: Nicolaas Rudolf Kemper , Sjoerd Nicolaas Lambertus Donders , Joost Jeroen Ottens , Edwin Cornelis Kadijk , Sergei Shulepov
- 申请人: Nicolaas Rudolf Kemper , Sjoerd Nicolaas Lambertus Donders , Joost Jeroen Ottens , Edwin Cornelis Kadijk , Sergei Shulepov
- 申请人地址: NL Veldhoven
- 专利权人: Asml Netherlands B.V.
- 当前专利权人: Asml Netherlands B.V.
- 当前专利权人地址: NL Veldhoven
- 代理机构: Pillsbury Winthrop Shaw Pittman LLP
- 主分类号: G03B27/42
- IPC分类号: G03B27/42
摘要:
Embodiments of a drain in a lithographic projection apparatus are described that have, for example, a feature which reduces inflow of gas into the drain during a period when no liquid is present in the drain. In one example, a passive liquid removal mechanism is provided such that the pressure of gas in the drain is equal to the ambient gas pressure and in another embodiment a flap is provided to close off a chamber during times when no liquid needs removing.
公开/授权文献
- US20070229786A1 Lithographic apparatus and device manufacturing method 公开/授权日:2007-10-04