Invention Grant
US08030628B2 Pulse modifier, lithographic apparatus and device manufacturing method
有权
脉冲调制器,光刻设备和器件制造方法
- Patent Title: Pulse modifier, lithographic apparatus and device manufacturing method
- Patent Title (中): 脉冲调制器,光刻设备和器件制造方法
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Application No.: US12324218Application Date: 2008-11-26
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Publication No.: US08030628B2Publication Date: 2011-10-04
- Inventor: Hako Botma
- Applicant: Hako Botma
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C
- Main IPC: G03R23/02
- IPC: G03R23/02 ; H01L3/13

Abstract:
A pulse modifier, and associated lithographic apparatus and a method for manufacturing a device, is disclosed. The pulse modifier is configured to receive an input pulse of radiation and further configured to emit a plurality of corresponding output pulse portions of radiation, wherein the respective pulse portions are respectively mirrored about an axis transverse to the optical axis and mirrored about a point of the optical axis of the pulse portions.
Public/Granted literature
- US20090159819A1 Pulse Modifier, Lithographic Apparatus and Device Manufacturing Method Public/Granted day:2009-06-25
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