Invention Grant
US08032348B2 System and method for using first-principles simulation to facilitate a semiconductor manufacturing process 有权
使用第一原理模拟以促进半导体制造过程的系统和方法

System and method for using first-principles simulation to facilitate a semiconductor manufacturing process
Abstract:
A method, system and computer readable medium for facilitating a process performed by a semiconductor processing tool. The method includes inputting data relating to a process performed by the semiconductor processing tool and inputting a first principles physical model relating to the semiconductor processing tool. First principles simulation is then performed using the input data and the physical model to provide a first principles simulation result, and the first principles simulation result is used to facilitate the process performed by the semiconductor processing tool.
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