Invention Grant
US08034641B2 Method for inspection of defects on a substrate 有权
检查基板上的缺陷的方法

Method for inspection of defects on a substrate
Abstract:
A method for inspection of defects on a substrate includes positioning a probe of a scanning probe microscopy (SPM) over and spaced apart from a substrate, includes scanning the substrate by changing a relative position of the probe with respect to the substrate on a plane spaced apart from and parallel to the substrate, and includes measuring a value of an induced current generated via the probe in at least two different regions of the substrate. The value of the induced current is variable according to at least a shape and a material of the substrate. The method further includes determining whether a defect exists by comparing the values of the induced currents measured in the at least two different regions of the substrate.
Public/Granted literature
Information query
Patent Agency Ranking
0/0