发明授权
- 专利标题: Core substrate and method of producing the same
- 专利标题(中): 核心基材及其制造方法
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申请号: US12170963申请日: 2008-07-10
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公开(公告)号: US08035037B2公开(公告)日: 2011-10-11
- 发明人: Kenji Iida , Tomoyuki Abe , Yasutomo Maehara , Shin Hirano , Takashi Nakagawa , Hideaki Yoshimura , Seigo Yamawaki , Norikazu Ozaki
- 申请人: Kenji Iida , Tomoyuki Abe , Yasutomo Maehara , Shin Hirano , Takashi Nakagawa , Hideaki Yoshimura , Seigo Yamawaki , Norikazu Ozaki
- 申请人地址: JP Kawasaki
- 专利权人: Fujitsu Limited
- 当前专利权人: Fujitsu Limited
- 当前专利权人地址: JP Kawasaki
- 代理机构: Staas & Halsey LLP
- 优先权: JP2007-267157 20071012
- 主分类号: H05K1/11
- IPC分类号: H05K1/11
摘要:
The core substrate is capable of securely preventing short circuit between an electrically conductive core section and a plated through-hole section. The core substrate comprises: an electrically conductive core section having a pilot hole, through which a plated through-hole section is formed; electrically conductive layers coating the inner face of the pilot hole and a surface of the core section; a gas purging hole being formed in the conductive layer coating the surface of the core section; an insulating material filling a space between the inner face of the pilot hole and an outer circumferential face of the plated through-hole section; and cable layers being laminated on both side faces of the core section.
公开/授权文献
- US20090095524A1 CORE SUBSTRATE AND METHOD OF PRODUCING THE SAME 公开/授权日:2009-04-16
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