发明授权
US08035082B2 Projection electron beam apparatus and defect inspection system using the apparatus
有权
投影电子束装置和使用该装置的缺陷检查系统
- 专利标题: Projection electron beam apparatus and defect inspection system using the apparatus
- 专利标题(中): 投影电子束装置和使用该装置的缺陷检查系统
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申请号: US12580505申请日: 2009-10-16
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公开(公告)号: US08035082B2公开(公告)日: 2011-10-11
- 发明人: Yuichiro Yamazaki , Ichirota Nagahama
- 申请人: Yuichiro Yamazaki , Ichirota Nagahama
- 申请人地址: JP Tokyo
- 专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人地址: JP Tokyo
- 代理机构: Westerman, Hattori, Daniels & Adrian, LLP
- 优先权: JP2005-059504 20050303; JP2005-092297 20050328; JP2005-092314 20050328
- 主分类号: H01J37/244
- IPC分类号: H01J37/244
摘要:
A sample is evaluated at a high throughput by reducing axial chromatic aberration and increasing the transmittance of secondary electrons. Electron beams emitted from an electron gun 1 are irradiated onto a sample 7 through a primary electro-optical system, and electrons consequently emitted from the sample are detected by a detector 12 through a secondary electro-optical system. A Wien filter 8 comprising a multi-pole lens for correcting axial chromatic aberration is disposed between a magnification lens 10 in the secondary electro-optical system and a beam separator 5 for separating a primary electron beam and a secondary electron beam, for correcting axial chromatic aberration caused by an objective lens 14 which comprises an electromagnetic lens having a magnetic gap defined on a sample side.
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