Invention Grant
US08035082B2 Projection electron beam apparatus and defect inspection system using the apparatus
有权
投影电子束装置和使用该装置的缺陷检查系统
- Patent Title: Projection electron beam apparatus and defect inspection system using the apparatus
- Patent Title (中): 投影电子束装置和使用该装置的缺陷检查系统
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Application No.: US12580505Application Date: 2009-10-16
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Publication No.: US08035082B2Publication Date: 2011-10-11
- Inventor: Yuichiro Yamazaki , Ichirota Nagahama
- Applicant: Yuichiro Yamazaki , Ichirota Nagahama
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JP2005-059504 20050303; JP2005-092297 20050328; JP2005-092314 20050328
- Main IPC: H01J37/244
- IPC: H01J37/244

Abstract:
A sample is evaluated at a high throughput by reducing axial chromatic aberration and increasing the transmittance of secondary electrons. Electron beams emitted from an electron gun 1 are irradiated onto a sample 7 through a primary electro-optical system, and electrons consequently emitted from the sample are detected by a detector 12 through a secondary electro-optical system. A Wien filter 8 comprising a multi-pole lens for correcting axial chromatic aberration is disposed between a magnification lens 10 in the secondary electro-optical system and a beam separator 5 for separating a primary electron beam and a secondary electron beam, for correcting axial chromatic aberration caused by an objective lens 14 which comprises an electromagnetic lens having a magnetic gap defined on a sample side.
Public/Granted literature
- US20100096550A1 PROJECTION ELECTRON BEAM APPARATUS AND DEFECT INSPECTION SYSTEM USING THE APPARATUS Public/Granted day:2010-04-22
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