发明授权
- 专利标题: Semiconductor device and a manufacturing method thereof
- 专利标题(中): 半导体装置及其制造方法
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申请号: US12574438申请日: 2009-10-06
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公开(公告)号: US08036036B2公开(公告)日: 2011-10-11
- 发明人: Nobuyasu Nishiyama
- 申请人: Nobuyasu Nishiyama
- 申请人地址: JP Tokyo
- 专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人地址: JP Tokyo
- 代理机构: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 优先权: JP2006-168171 20060616
- 主分类号: G11C16/04
- IPC分类号: G11C16/04
摘要:
A semiconductor device includes at least two adjacent memory cell blocks, each of the memory cell blocks having a plurality of memory cell units, each of memory cell units having a plurality of electrically reprogrammable and erasable memory cells connected in series, a plurality of cell gates for selecting the plurality of memory cells within the two adjacent memory cell blocks, each of the plurality of cell gates being formed with roughly rectangular closed loops or roughly U shaped open loops, each of the loops being connected to a corresponding cell of the memory cells in a corresponding memory cell unit of the plurality of memory cell units within one of the two adjacent memory cell blocks and being connected to a corresponding memory cell of the memory cells in a corresponding memory cell unit of the plurality of memory cell units within the other memory cell block of the two adjacent memory cell blocks and a plurality of pairs of first and second selection gates for selecting the memory cell block, the plurality of cell gates being located between one pair of the first and second selection gates within a corresponding block of the memory cell block.
公开/授权文献
- US20100027338A1 SEMICONDUCTOR DEVICE AND A MANUFACTURING METHOD THEREOF 公开/授权日:2010-02-04
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