发明授权
US08037433B2 System and methodology for determining layout-dependent effects in ULSI simulation
有权
用于确定ULSI仿真中与布局有关的影响的系统和方法
- 专利标题： System and methodology for determining layout-dependent effects in ULSI simulation
- 专利标题（中）： 用于确定ULSI仿真中与布局有关的影响的系统和方法
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申请号： US12196471申请日： 2008-08-22
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公开(公告)号： US08037433B2公开(公告)日： 2011-10-11
- 发明人: Dureseti Chidambarrao , Tong Li , Richard Q. Williams , David W. Winston
- 申请人： Dureseti Chidambarrao , Tong Li , Richard Q. Williams , David W. Winston
- 申请人地址： US NY Armonk
- 专利权人： International Business Machines Corporation
- 当前专利权人： International Business Machines Corporation
- 当前专利权人地址： US NY Armonk
- 代理机构： Scully, Scott, Murphy & Presser, P.C.
- 代理商 H. Daniel Schnurmann
- 主分类号： G06F17/50
- IPC分类号： G06F17/50
摘要：
A layout of a semiconductor circuit is analyzed to calculate layout-dependant parameters that can include a mobility shift and a threshold voltage shift. Layout-dependant effects that affect the layout dependant parameters may include stress effects, rapid thermal anneal (RTA) effects, and lithographic effects. Intrinsic functions that do not reflect the layout-dependant effects are calculated, followed by calculation of scaling modifiers based on the layout-dependant parameters. A model output function that reflects the layout-dependant effects is obtained by multiplication of each of the intrinsic functions with a corresponding scaling parameter.
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