发明授权
US08038895B2 Method and appartus for detection of mechanical defects in an ingot piece composed of semiconductor material
有权
用于检测由半导体材料构成的锭块中的机械缺陷的方法和附件
- 专利标题: Method and appartus for detection of mechanical defects in an ingot piece composed of semiconductor material
- 专利标题(中): 用于检测由半导体材料构成的锭块中的机械缺陷的方法和附件
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申请号: US11764854申请日: 2007-06-19
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公开(公告)号: US08038895B2公开(公告)日: 2011-10-18
- 发明人: Ludwig Koester , Peter Czurratis , Klaus Kraemer
- 申请人: Ludwig Koester , Peter Czurratis , Klaus Kraemer
- 申请人地址: DE Munich
- 专利权人: Siltronic AG
- 当前专利权人: Siltronic AG
- 当前专利权人地址: DE Munich
- 代理机构: Brooks Kushman P.C.
- 优先权: DE102006028650 20060622; DE102006032431 20060713
- 主分类号: B31D3/00
- IPC分类号: B31D3/00
摘要:
A method for detection of mechanical defects in a semiconductor ingot section which has at least one planar surface, and a thickness at right angles to this surface of 1 cm to 100 cm, involves scanning the planar surface by at least one ultrasound head which is coupled via a liquid coupling medium to the planar surface and, at each measurement point (x,y) producing at least one ultrasound pulse which is directed at the planar surface of the ingot section, recording the ultrasound-pulse echo as a function of time, such that an echo from the planar surface, an echo from a surface opposite the planar surface, and further echoes are detected, with the positions (xp, yp, zp) of mechanical defects in the ingot section being determined from the further echoes.
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