发明授权
- 专利标题： Resist composition and patterning process
- 专利标题（中）： 抗蚀剂组成和图案化工艺
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申请号： US12167151申请日： 2008-07-02
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公开(公告)号： US08043788B2公开(公告)日： 2011-10-25
- 发明人: Tomohiro Kobayashi , Jun Hatakeyama , Yuji Harada
- 申请人： Tomohiro Kobayashi , Jun Hatakeyama , Yuji Harada
- 申请人地址： JP Toyko
- 专利权人： Shin-Etsu Chemical Co., Ltd.
- 当前专利权人： Shin-Etsu Chemical Co., Ltd.
- 当前专利权人地址： JP Toyko
- 代理机构： Birch, Stewart, Kolasch & Birch, LLP
- 优先权： JP2007-176011 20070704
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; G03F7/30
摘要：
To a resist composition comprising a polymer which changes its alkali solubility under the action of an acid as a base resin, is added a copolymer comprising recurring units containing amino and recurring units containing α-trifluoromethylhydroxy as an additive. The composition is suited for immersion lithography.
公开/授权文献
- US20090011365A1 RESIST COMPOSITION AND PATTERNING PROCESS 公开/授权日：2009-01-08
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