发明授权
- 专利标题: Wide range radiation detector and manufacturing method
- 专利标题(中): 宽范围辐射探测器及制造方法
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申请号: US11454522申请日: 2006-06-16
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公开(公告)号: US08044476B2公开(公告)日: 2011-10-25
- 发明人: Yoshinori Hatanaka , Toru Aoki
- 申请人: Yoshinori Hatanaka , Toru Aoki
- 申请人地址: JP
- 专利权人: National University Corporation Shizuoka University
- 当前专利权人: National University Corporation Shizuoka University
- 当前专利权人地址: JP
- 代理机构: Ostrolenk Faber LLP
- 优先权: JP2003-418086 20031216; JP2003-433694 20031226
- 主分类号: H01L31/00
- IPC分类号: H01L31/00
摘要:
A radiation detector comprising a II-VI compound semiconductor substrate that absorbs radiation having a first energy, a II-VI compound semiconductor layer of a first conductivity type provided on a main surface of the II-VI compound semiconductor substrate, a metal layer containing at least one of a group III element and a group V element provided on the II-VI compound semiconductor layer, a IV semiconductor layer having a second conductivity type opposite to the first conductivity type provided on the metal layer, and a IV semiconductor substrate that absorbs radiation having a second energy different from the first energy provided on the IV semiconductor layer.
公开/授权文献
- US20070176200A1 Wide range radiation detector and manufacturing method 公开/授权日:2007-08-02
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