发明授权
- 专利标题: Method and system for calibrating measurement tools for semiconductor device manufacturing
- 专利标题(中): 用于校准半导体器件制造测量工具的方法和系统
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申请号: US11193016申请日: 2005-07-29
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公开(公告)号: US08044668B2公开(公告)日: 2011-10-25
- 发明人: Eugene Wang , Yu Chen
- 申请人: Eugene Wang , Yu Chen
- 申请人地址: CN Shanghai
- 专利权人: Semiconductor Manufacturing International (Shanghai) Corporation
- 当前专利权人: Semiconductor Manufacturing International (Shanghai) Corporation
- 当前专利权人地址: CN Shanghai
- 代理机构: Kilpatrick Townsend and Stockton LLP
- 优先权: CN200510027816 20050714
- 主分类号: G01R35/00
- IPC分类号: G01R35/00
摘要:
A method and system for calibrating a plurality of measurement systems. The method includes obtaining a first plurality of calibration standards. The first plurality of calibration standards is associated with a plurality of predetermined values. Additionally, the method includes measuring the first plurality of calibration standards by a plurality of measurement systems to obtain a first plurality of measured values, processing information associated with the first plurality of measured values, and selecting a first measurement system from the plurality of measurement systems based on at least information associated with the first plurality of measured values. Moreover, the method includes calibrating the first measurement system with the first plurality of calibration standards, obtaining a second plurality of calibration standards, and measuring the second plurality of calibration standards by the first measurement system to obtain a second plurality of measured values.
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