Invention Grant
- Patent Title: Sub-diffraction-limited imaging systems and methods
- Patent Title (中): 次衍射限制成像系统和方法
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Application No.: US12473402Application Date: 2009-05-28
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Publication No.: US08045253B2Publication Date: 2011-10-25
- Inventor: Jingjing Li , Philip J. Kuekes
- Applicant: Jingjing Li , Philip J. Kuekes
- Applicant Address: US TX Houston
- Assignee: Hewlett-Packard Development Company, L.P.
- Current Assignee: Hewlett-Packard Development Company, L.P.
- Current Assignee Address: US TX Houston
- Main IPC: G02F1/03
- IPC: G02F1/03 ; G02F1/29 ; G02B5/18

Abstract:
Various embodiments of the present invention are directed to systems and methods for obtaining images of objects with higher resolution than the diffraction limit. In one aspect, a method for collecting evanescent waves scattered from an object comprises electronically configuring a reconfigurable device to operate as a grating for one or more lattice periods using a computing device. Propagating waves scattered from the object pass through the reconfigurable device and a portion of evanescent waves scattered from the object are projected into the far field of the object. The method includes detecting propagating waves and detecting the portion of evanescent waves projected into the far field for each lattice period using an imaging system.
Public/Granted literature
- US20100302625A1 SUB-DIFFRACTION-LIMITED IMAGING SYSTEMS AND METHODS Public/Granted day:2010-12-02
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