Invention Grant
- Patent Title: Electron emission device
- Patent Title (中): 电子发射装置
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Application No.: US12414666Application Date: 2009-03-31
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Publication No.: US08049401B2Publication Date: 2011-11-01
- Inventor: Po-Hung Wang , Jung-Yu Li , Shih-Pu Chen , Yi-Ping Lin , Yen-I Chou , Ming-Chung Liu
- Applicant: Po-Hung Wang , Jung-Yu Li , Shih-Pu Chen , Yi-Ping Lin , Yen-I Chou , Ming-Chung Liu
- Applicant Address: TW Hsinchu
- Assignee: Industrial Technology Research Institute
- Current Assignee: Industrial Technology Research Institute
- Current Assignee Address: TW Hsinchu
- Agency: Jianq Chyun IP Office
- Priority: TW97147162A 20081204
- Main IPC: H01J17/00
- IPC: H01J17/00

Abstract:
An electron emission device including a first substrate, a second substrate, a gas, a sealant, and a phosphor layer is provided. The first substrate has a cathode thereon, and the cathode has a patterned profile. The second substrate is opposite to the first substrate and has an anode thereon. The sealant is disposed at edges of the first substrate and the second substrate to assemble the first and second substrates. The gas is disposed between the cathode and the anode and configured to induce a plurality of electrons from the cathode, wherein the pressure of the gas is between 10 torr and 10−3 torr. The phosphor layer is disposed on the moving path of the electrons to react with the electrons so as to emit light.
Public/Granted literature
- US20100141112A1 ELECTRON EMISSION DEVICE AND METHOD OF PACKAGING THE SAME Public/Granted day:2010-06-10
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