发明授权
US08053059B2 Substrate for patterning and method for forming a pattern of nanocrystals using the same
有权
用于图案化的基板以及使用其形成纳米晶体图案的方法
- 专利标题： Substrate for patterning and method for forming a pattern of nanocrystals using the same
- 专利标题（中）： 用于图案化的基板以及使用其形成纳米晶体图案的方法
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申请号： US11757018申请日： 2007-06-01
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公开(公告)号： US08053059B2公开(公告)日： 2011-11-08
- 发明人: Seong Jae Choi , Kyung Sang Cho , Jae Young Choi , Dong Kee Yi , Hyeon Jin Shin , Seon Mi Yoon , In Young Song , Jong Hyeon Lee , Duk Young Jung , Geun Tae Cho
- 申请人： Seong Jae Choi , Kyung Sang Cho , Jae Young Choi , Dong Kee Yi , Hyeon Jin Shin , Seon Mi Yoon , In Young Song , Jong Hyeon Lee , Duk Young Jung , Geun Tae Cho
- 申请人地址： KR
- 专利权人： Samsung Electronics Co., Ltd.
- 当前专利权人： Samsung Electronics Co., Ltd.
- 当前专利权人地址： KR
- 代理机构： Cantor Colburn LLP
- 优先权： KR10-2007-0008357 20070126
- 主分类号： B32B3/14
- IPC分类号： B32B3/14 ; B32B3/02 ; B05D5/00
摘要：
Provided is a substrate for forming a pattern comprising an inorganic layer having a modified surface, wherein the modified surface is formed by coating a surface of the inorganic layer with a bifunctional molecule comprising a functional group having an affinity for a nanocrystal at one end of the molecule and a functional group having an affinity for the inorganic layer at the other end of the molecule. A method for forming a pattern of nanocrystals is also provided.