Invention Grant
US08053071B2 Impact absorption layer having excellent impact resistance and film having use of impact absorption comprising the same
有权
具有优异抗冲击性的冲击吸收层和使用其的具有冲击吸收性的薄膜
- Patent Title: Impact absorption layer having excellent impact resistance and film having use of impact absorption comprising the same
- Patent Title (中): 具有优异抗冲击性的冲击吸收层和使用其的具有冲击吸收性的薄膜
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Application No.: US12448520Application Date: 2008-01-09
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Publication No.: US08053071B2Publication Date: 2011-11-08
- Inventor: Hyun Seok Choi , Sang Hyun Park , Yeon Keun Lee , Ik Hwan Cho
- Applicant: Hyun Seok Choi , Sang Hyun Park , Yeon Keun Lee , Ik Hwan Cho
- Applicant Address: KR Seoul
- Assignee: LG Chem, Ltd.
- Current Assignee: LG Chem, Ltd.
- Current Assignee Address: KR Seoul
- Agency: McKenna Long & Aldridge LLP
- Priority: KR10-2007-0002658 20070109
- International Application: PCT/KR2008/000126 WO 20080109
- International Announcement: WO2008/084978 WO 20080717
- Main IPC: B32B3/26
- IPC: B32B3/26

Abstract:
There is provided a film having use of impact absorption capable of protecting a panel from impacts when the impacts are given to a display device, a window since it has an excellent ability to absorb impacts given to a surface of a display device, a window, or equivalent base plates. The impact absorption layer having a thickness of 30 μm or more has a hardness of 20 to 100 as measured at a room temperature using an Asker C hardness tester. Also, the film having use of impact absorption has excellent impact resistance and includes at least one layer, wherein the film includes at least one impact absorption layer having a hardness of 20 to 100 as measured at a room temperature using an Asker C hardness tester, the impact absorption layer having the total thickness of 30 μm or more.
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