发明授权
US08053071B2 Impact absorption layer having excellent impact resistance and film having use of impact absorption comprising the same
有权
具有优异抗冲击性的冲击吸收层和使用其的具有冲击吸收性的薄膜
- 专利标题: Impact absorption layer having excellent impact resistance and film having use of impact absorption comprising the same
- 专利标题(中): 具有优异抗冲击性的冲击吸收层和使用其的具有冲击吸收性的薄膜
-
申请号: US12448520申请日: 2008-01-09
-
公开(公告)号: US08053071B2公开(公告)日: 2011-11-08
- 发明人: Hyun Seok Choi , Sang Hyun Park , Yeon Keun Lee , Ik Hwan Cho
- 申请人: Hyun Seok Choi , Sang Hyun Park , Yeon Keun Lee , Ik Hwan Cho
- 申请人地址: KR Seoul
- 专利权人: LG Chem, Ltd.
- 当前专利权人: LG Chem, Ltd.
- 当前专利权人地址: KR Seoul
- 代理机构: McKenna Long & Aldridge LLP
- 优先权: KR10-2007-0002658 20070109
- 国际申请: PCT/KR2008/000126 WO 20080109
- 国际公布: WO2008/084978 WO 20080717
- 主分类号: B32B3/26
- IPC分类号: B32B3/26
摘要:
There is provided a film having use of impact absorption capable of protecting a panel from impacts when the impacts are given to a display device, a window since it has an excellent ability to absorb impacts given to a surface of a display device, a window, or equivalent base plates. The impact absorption layer having a thickness of 30 μm or more has a hardness of 20 to 100 as measured at a room temperature using an Asker C hardness tester. Also, the film having use of impact absorption has excellent impact resistance and includes at least one layer, wherein the film includes at least one impact absorption layer having a hardness of 20 to 100 as measured at a room temperature using an Asker C hardness tester, the impact absorption layer having the total thickness of 30 μm or more.
公开/授权文献
信息查询