发明授权
US08053158B2 Photosensitive compositions useful for forming active patterns, methods of forming such active patterns and organic memory devices incorporating such active patterns
有权
用于形成活性图案的光敏组合物,形成这种活性图案的方法和结合这种活性图案的有机记忆装置
- 专利标题: Photosensitive compositions useful for forming active patterns, methods of forming such active patterns and organic memory devices incorporating such active patterns
- 专利标题(中): 用于形成活性图案的光敏组合物,形成这种活性图案的方法和结合这种活性图案的有机记忆装置
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申请号: US11655171申请日: 2007-01-19
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公开(公告)号: US08053158B2公开(公告)日: 2011-11-08
- 发明人: Sang Kyun Lee , Won Jae Joo , Kwang Hee Lee , Tae Lim Choi , Myung Sup Jung
- 申请人: Sang Kyun Lee , Won Jae Joo , Kwang Hee Lee , Tae Lim Choi , Myung Sup Jung
- 申请人地址: KR Gyeonggi-do
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR Gyeonggi-do
- 代理机构: Harness, Dickey & Pierce, P.L.C.
- 优先权: KR10-2006-0005828 20060119; KR10-2007-0005362 20070117
- 主分类号: G03F7/004
- IPC分类号: G03F7/004
摘要:
Disclosed herein are compositions useful in forming organic active patterns that may, in turn, be incorporated in organic memory devices. The compositions comprise N-containing conjugated electroconductive polymer(s), photoacid generator(s) and organic solvent(s) capable of dissolving suitable quantifies of both the electroconductive polymer and the photoacid generator. Also disclosed are methods for patterning organic active layers formed using one or more of the compositions to produce organic active patterns, portions of which may be arranged between opposed electrodes to provide organic memory cells. The methods include directly exposing and developing the organic active layer to obtain fine patterns without the use of a separate masking pattern, for example, a photoresist pattern, thereby tending to simplify the fabrication process and reduce the associated costs.
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