发明授权
US08054304B2 Photo detector and method for fabricating the same 有权
光电检测器及其制造方法

  • 专利标题: Photo detector and method for fabricating the same
  • 专利标题(中): 光电检测器及其制造方法
  • 申请号: US11943602
    申请日: 2007-11-21
  • 公开(公告)号: US08054304B2
    公开(公告)日: 2011-11-08
  • 发明人: Yu-Min LinHsin-Li ChenFeng-Yuan Gan
  • 申请人: Yu-Min LinHsin-Li ChenFeng-Yuan Gan
  • 申请人地址: TW Science-Based Industrial Park, Hsin-Chu
  • 专利权人: AU Optronics Corp.
  • 当前专利权人: AU Optronics Corp.
  • 当前专利权人地址: TW Science-Based Industrial Park, Hsin-Chu
  • 代理商 Winston Hsu; Scott Margo
  • 优先权: TW96127644A 20070727
  • 主分类号: G06F3/038
  • IPC分类号: G06F3/038 G09G5/00
Photo detector and method for fabricating the same
摘要:
A photo detector is disclosed. The photo detector includes a substrate, a first patterned semiconductor layer with a first state, a dielectric layer, a patterned conductive layer, an inter-layer dielectric, a second patterned semiconductor layer with a second state, two first electrodes disposed on the inter-layer dielectric and two second electrodes disposed on portions of the second semiconductor layer. The first patterned semiconductor layer having a first doping region and a second doping region is disposed on a transistor region of the substrate. The dielectric layer is disposed to cover the substrate and the first semiconductor layer, the patterned conductive layer is disposed on the dielectric layer, and the inter-layer dielectric having at least two openings adapted to expose the first doping region and the second doping region is disposed to cover the dielectric layer. The second patterned semiconductor layer is disposed on a photosensitive region and the first electrodes are electrically connected to the first patterned semiconductor layer.
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