发明授权
- 专利标题: Semiconductor device
- 专利标题(中): 半导体器件
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申请号: US11812291申请日: 2007-06-18
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公开(公告)号: US08058694B2公开(公告)日: 2011-11-15
- 发明人: Hiroshi Shimomura
- 申请人: Hiroshi Shimomura
- 申请人地址: JP Osaka
- 专利权人: Panasonic Corporation
- 当前专利权人: Panasonic Corporation
- 当前专利权人地址: JP Osaka
- 代理机构: McDermott Will & Emery LLP
- 优先权: JP2006-168935 20060619
- 主分类号: H01L27/088
- IPC分类号: H01L27/088
摘要:
In a semiconductor device, such as a MOSFET or the like, which is a high-frequency LSI achieving a low noise figure and a high maximum oscillation frequency and which has unit cells with a ring-shaped gate electrode arranged in an array, gate drawing wires connecting together the gate electrode and gate contact pad portions are arranged on a region excluding a drain region and a source region, that is, on an isolation region. Bending portions of the ring-shaped gate electrode are all formed on the isolation region. This therefore permits an improvement in high frequency characteristics such as noise, the maximum oscillation frequency, and the like while eliminating unnecessary gate capacity addition, and also permits small characteristic variation even if a machining shape of the bending portions of the gate electrode is unstable.
公开/授权文献
- US20080122014A1 Semiconductor device 公开/授权日:2008-05-29
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