发明授权
US08059884B2 Method and system for obtaining bounds on process parameters for OPC-verification 有权
用于获取OPC验证过程参数界限的方法和系统

Method and system for obtaining bounds on process parameters for OPC-verification
摘要:
Embodiments of the present invention provide a method of performing printability verification of a mask layout. The method includes creating one or more tight clusters; computing a set of process parameters associated with a point on said mask; comparing said set of process parameters to said one or more tight clusters; and reporting an error when at least one of said process parameters is away from said one or more tight clusters.
信息查询
0/0