发明授权
- 专利标题: High speed flat lapping platen
- 专利标题(中): 高速平板研磨压板
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申请号: US12217565申请日: 2008-07-07
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公开(公告)号: US08062098B2公开(公告)日: 2011-11-22
- 发明人: Wayne O. Duescher
- 申请人: Wayne O. Duescher
- 代理机构: Mark A. Litman & Associates, PA
- 主分类号: B24B27/00
- IPC分类号: B24B27/00 ; B24D9/10
摘要:
A rotatable abrasive lapper machine platen assembly is attached to a lapper machine frame. The assembly has at least: a) a circular-shaped rotatable horizontal platen having i) a front surface and ii) a back surface; b) the circular platen having a platen radius, a platen outer circumference and a platen outer periphery; c) the circular platen front surface having an outer annular planar portion where the platen outer annular planar portion extends radially to the circular platen outer circumference; and d) a flexible abrasive disk secured in conformable flat contact with the circular platen front surface outer annular planar portion wherein the abrasive disk is positioned concentric with the circular platen.
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