Invention Grant
- Patent Title: X-ray analysis apparatus and X-ray analysis method
- Patent Title (中): X射线分析仪和X射线分析法
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Application No.: US12494851Application Date: 2009-06-30
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Publication No.: US08068583B2Publication Date: 2011-11-29
- Inventor: Yoshiki Matoba , Kanji Nagasawa
- Applicant: Yoshiki Matoba , Kanji Nagasawa
- Applicant Address: JP
- Assignee: SII Nanotechnology Inc.
- Current Assignee: SII Nanotechnology Inc.
- Current Assignee Address: JP
- Agency: Brinks Hofer Gilson & Lione
- Priority: JP2008-172006 20080701; JP2008-277731 20081029
- Main IPC: G01B15/00
- IPC: G01B15/00 ; G01N23/201

Abstract:
Provided is an X-ray analysis apparatus including: an X-ray tubular bulb for irradiating a sample with a radiation beam; an X-ray detector for detecting a characteristic X-ray and a scattered X-ray and outputting a signal containing energy information on the characteristic X-ray and the scattered X-ray; an analyzer for analyzing the signal; a sample stage capable of moving an irradiation point relatively with respect to the sample within a mapping area set in advance; and an X-ray mapping processing section for discriminating an X-ray intensity corresponding to a specific element, determining an intensity contrast in which a color or lightness is changed in accordance with the X-ray intensity, and for performing image display at a position corresponding to the irradiation point, in which the X-ray mapping processing section determines the intensity contrast of the X-ray intensity at the irradiation point by setting in advance the X-ray intensity discriminated as to a reference material in which a component element and a concentration thereof are known as a reference.
Public/Granted literature
- US20100002833A1 X-RAY ANALYSIS APPARATUS AND X-RAY ANALYSIS METHOD Public/Granted day:2010-01-07
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