发明授权
- 专利标题: Interspinous process implant with slide-in distraction piece and method of implantation
- 专利标题(中): 椎间植入植入物与插入式牵引片及植入方法
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申请号: US11378893申请日: 2006-03-17
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公开(公告)号: US08070778B2公开(公告)日: 2011-12-06
- 发明人: James F. Zucherman , Ken Y. Hsu , Henry Klyce , Charles J. Winslow , Scott A. Yerby , John J. Flynn , Steve Mitchell , John A. Markwart
- 申请人: James F. Zucherman , Ken Y. Hsu , Henry Klyce , Charles J. Winslow , Scott A. Yerby , John J. Flynn , Steve Mitchell , John A. Markwart
- 申请人地址: CH Neuchatel
- 专利权人: Kyphon Sarl
- 当前专利权人: Kyphon Sarl
- 当前专利权人地址: CH Neuchatel
- 主分类号: A61B17/70
- IPC分类号: A61B17/70
摘要:
Systems and method in accordance with embodiments of the present invention can includes an implant having an initiating piece and a distraction piece. The initiating piece can include a lower distraction element, a second wing, a lower portion of a spacer, and a lower portion of a first wing. The initiating piece can be positioned such that an interspinous ligament of the targeted motion segment is disposed between the first and second wing. The distraction piece can include an upper distraction element, an upper portion of the spacer, and an upper portion of the first wing, and can be mated with the initiating piece by mating a rail of the distraction piece with a slot of the initiating piece, thereby disposing the implant between adjacent spinous processes.
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