发明授权
- 专利标题: Embedded phase-change memory and method of fabricating the same
- 专利标题(中): 嵌入式相变存储器及其制造方法
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申请号: US12942255申请日: 2010-11-09
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公开(公告)号: US08071396B2公开(公告)日: 2011-12-06
- 发明人: Seung-Yun Lee , Sangouk Ryu , Sung Min Yoon , Young Sam Park , Kyu-Jeong Choi , Nam-Yeal Lee , Byoung-Gon Yu
- 申请人: Seung-Yun Lee , Sangouk Ryu , Sung Min Yoon , Young Sam Park , Kyu-Jeong Choi , Nam-Yeal Lee , Byoung-Gon Yu
- 申请人地址: KR Daejeon
- 专利权人: Electronics and Telecommunications Research Institute
- 当前专利权人: Electronics and Telecommunications Research Institute
- 当前专利权人地址: KR Daejeon
- 代理机构: Ladas & Parry LLP
- 优先权: KR10-2005-0120101 20051208; KR10-2006-0038331 20060427
- 主分类号: H01L21/00
- IPC分类号: H01L21/00
摘要:
An embedded memory required for a high performance, multifunction SOC, and a method of fabricating the same are provided. The memory includes a bipolar transistor, a phase-change memory device and a MOS transistor, adjacent and electrically connected, on a substrate. The bipolar transistor includes a base composed of SiGe disposed on a collector. The phase-change memory device has a phase-change material layer which is changed from an amorphous state to a crystalline state by a current, and a heating layer composed of SiGe that contacts the lower surface of the phase-change material layer.
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