发明授权
US08072589B2 System and method for photoemission-based defect detection 有权
用于基于光电子缺陷检测的系统和方法

  • 专利标题: System and method for photoemission-based defect detection
  • 专利标题(中): 用于基于光电子缺陷检测的系统和方法
  • 申请号: US12326859
    申请日: 2008-12-02
  • 公开(公告)号: US08072589B2
    公开(公告)日: 2011-12-06
  • 发明人: Neeraj Khurana
  • 申请人: Neeraj Khurana
  • 申请人地址: US CA Fremont
  • 专利权人: DCG Systems, Inc.
  • 当前专利权人: DCG Systems, Inc.
  • 当前专利权人地址: US CA Fremont
  • 代理机构: Nixon Peabody LLP
  • 代理商 Joseph Bach, Esq.
  • 主分类号: G01N21/00
  • IPC分类号: G01N21/00
System and method for photoemission-based defect detection
摘要:
An IREM image of an IC is obtained. The emission intensity at each emission site is measured/calculated and is compared to reference intensity. The calculated intensity may be plotted against reference intensities. In general, the majority of the plotted intensities would lie in a given range within a straight line. However, for devices that exhibit an abnormal emission, the plot would result in an easily observable deviation from the line. The calculated intensity is used to make a determination of logical “1” or “0” for each device, which is automatically stored together with the corresponding test vector. The calculated logical states are then tabulated and compared against tabulation of reference logical states.
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