Invention Grant
- Patent Title: Method for making positive photosensitive planographic printing plate
- Patent Title (中): 正光敏平版印刷版的制作方法
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Application No.: US12050735Application Date: 2008-03-18
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Publication No.: US08075955B2Publication Date: 2011-12-13
- Inventor: Takao Taguchi , Ikuo Kawauchi
- Applicant: Takao Taguchi , Ikuo Kawauchi
- Applicant Address: JP Tokyo
- Assignee: Fujifilm Corporation
- Current Assignee: Fujifilm Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2007-087977 20070329
- Main IPC: B05D3/02
- IPC: B05D3/02 ; B05D3/04

Abstract:
A method for making a positive photosensitive planographic printing plate including of a base having formed thereon in this order an undercoat layer and an image recording layer, wherein the undercoat layer is obtained by applying an undercoat layer solution containing a solvent and an acrylic resin having an alkali-soluble group, followed by drying the coating, the image recording layer contains a novolac resin and an infrared absorbing agent, and the applied undercoat layer solution is dried in an undercoat layer drying step which includes a steam-containing hot air drying step using steam-containing hot air having a temperature of 90° C. to 200° C., and a relative humidity of 8% to 70%.
Public/Granted literature
- US20080241393A1 METHOD FOR MAKING POSITIVE PHOTOSENSITIVE PLANOGRAPHIC PRINTING PLATE Public/Granted day:2008-10-02
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