Invention Grant
- Patent Title: Positive-working imageable elements with chemical resistance
- Patent Title (中): 具有耐化学腐蚀性的正性可成像元件
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Application No.: US11971941Application Date: 2008-01-10
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Publication No.: US08076052B2Publication Date: 2011-12-13
- Inventor: Ting Tao , Jayanti Patel , Eric E. Clark
- Applicant: Ting Tao , Jayanti Patel , Eric E. Clark
- Applicant Address: US NY Rochester
- Assignee: Eastman Kodak Company
- Current Assignee: Eastman Kodak Company
- Current Assignee Address: US NY Rochester
- Agent J. Lanny Tucker
- Main IPC: G03F1/00
- IPC: G03F1/00 ; G03F7/00

Abstract:
Single- and multi-layer positive-working imageable elements include a first polymeric binder that is soluble in an alkaline developer upon exposure to imaging radiation and a radiation absorbing compound. The first polymeric binder comprises a backbone to which are attached pendant groups represented by the following Structure (I): wherein R1 and R2 are independently hydrogen or alkyl groups having 1 to 8 carbon atoms or aryl groups having 6 or 10 carbon atoms in the carbocyclic ring, L is a direct bond or a linking group having at least 1 carbon atom and optionally one or more nitrogen, oxygen, and sulfur atoms in the linking chain, and X is oxy, thio, or —NR— wherein R is hydrogen or an alkyl group having 1 to 8 carbon atoms or an aryl group having 6 or 10 carbon atoms in the carbocyclic ring.
Public/Granted literature
- US20090181326A1 POSITIVE-WORKING IMAGEABLE ELEMENTS WITH CHEMICAL RESISTANCE Public/Granted day:2009-07-16
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