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US08076125B2 Imagewise patterning of films and devices comprising the same 有权
胶片的成像图案化和包括其的装置

Imagewise patterning of films and devices comprising the same
Abstract:
The present invention is directed, at least in part, to methods for imagewise patterning of a surface. Such patterned surfaces can be used, e.g., in microfluidic devices. Accordingly, the present invention is also directed, at least in part, to nanopatterned devices which include a microchannel structure and methods for forming such devices.
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