发明授权
- 专利标题: Foil trap and extreme ultraviolet light source device using the foil trap
- 专利标题(中): 箔陷阱和使用箔陷阱的极紫外光源装置
-
申请号: US12038970申请日: 2008-02-28
-
公开(公告)号: US08076659B2公开(公告)日: 2011-12-13
- 发明人: Takahiro Shirai , Takahiro Inoue
- 申请人: Takahiro Shirai , Takahiro Inoue
- 申请人地址: JP Tokyo
- 专利权人: Ushiodenki Kabushiki Kaisha
- 当前专利权人: Ushiodenki Kabushiki Kaisha
- 当前专利权人地址: JP Tokyo
- 代理机构: Roberts Mlotkowski Safran & Cole, P.C.
- 代理商 David S. Safran
- 优先权: JP2007-076182 20070323
- 主分类号: G01J3/10
- IPC分类号: G01J3/10
摘要:
An extreme ultraviolet (EUV) light source device and foil trap, the device including a vessel; an EUV radiating species supply means that feeds an extreme ultraviolet radiating species into the vessel; a discharge part with discharge electrodes that heat and excite the EUV radiating species and generate a high-temperature plasma; a collector mirror collecting EUV radiation emitted from the plasma; the foil trap installed between the discharge part and the mirror; an extractor part extracting the collected radiation; and an evacuation means exhausting and regulating pressure within the vessel. The foil trap includes foils extending radially from a main axis thereof to capture debris from the light source, while allowing the emitted radiation to pass through a region thereof to the mirror. A length of at least part of the foils in directions parallel to the main axis is shorter in positions close to the main axis than distant therefrom.
公开/授权文献
信息查询