Invention Grant
- Patent Title: Chemical mechanical polishing system having multiple polishing stations and providing relative linear polishing motion
- Patent Title (中): 化学机械抛光系统具有多个抛光台并提供相对的线性抛光运动
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Application No.: US12581049Application Date: 2009-10-16
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Publication No.: US08079894B2Publication Date: 2011-12-20
- Inventor: Robert D. Tolles , Norman Shendon , Sasson Somekh , Ilya Perlov , Eugene Gantvarg , Harry Q. Lee
- Applicant: Robert D. Tolles , Norman Shendon , Sasson Somekh , Ilya Perlov , Eugene Gantvarg , Harry Q. Lee
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Fish & Richardson P.C.
- Main IPC: B24B7/22
- IPC: B24B7/22
Abstract:
A chemical-mechanical polishing apparatus including a table top, a transfer station mounted on the table top, a plurality of polishing stations mounted on the table top, a plurality of washing stations, and a plurality of carrier heads supported by a support member rotatable about an axis. Each washing station is located between a first polishing station and either a second polishing station or the transfer station, and the transfer station and the plurality of polishing stations are arranged at approximately equal angular intervals about the axis.
Public/Granted literature
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