发明授权
- 专利标题： Method of producing mask
- 专利标题（中）： 生产面膜的方法
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申请号： US12873652申请日： 2010-09-01
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公开(公告)号： US08080478B2公开(公告)日： 2011-12-20
- 发明人: Yuichi Ohsawa , Junichi Ito , Saori Kashiwada , Chikayoshi Kamata
- 申请人： Yuichi Ohsawa , Junichi Ito , Saori Kashiwada , Chikayoshi Kamata
- 申请人地址： JP Tokyo
- 专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人地址： JP Tokyo
- 代理机构： Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 优先权： JP2010-083395 20100331
- 主分类号： H01L21/00
- IPC分类号： H01L21/00
摘要：
According to one embodiment, a method of producing a mask includes: a step of forming a pattern on a substrate; a step of forming a first film that covers the top surface and side surface of the pattern and contains a first material; a step of forming a second film containing a second material on the first film; a step of performing anisotropic etching of the first and second films in a way that forms a sidewall layer including the first and second films on the side surface of the pattern and removes the first and second films on any location other than the sidewall layer; a step of performing isotropic etching of the first film of the sidewall layer; and a step of removing the pattern.
公开/授权文献
- US20110244688A1 METHOD OF PRODUCING MASK 公开/授权日：2011-10-06
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