Invention Grant
- Patent Title: Composite field emission source
- Patent Title (中): 复合场发射源
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Application No.: US12154903Application Date: 2008-05-27
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Publication No.: US08080929B2Publication Date: 2011-12-20
- Inventor: Jian-Min Jeng , Jyi-Tsong Lo , Wen-Ching Shih , Wei-Lung Tasi
- Applicant: Jian-Min Jeng , Jyi-Tsong Lo , Wen-Ching Shih , Wei-Lung Tasi
- Applicant Address: TW Taipei TW Taipei
- Assignee: Tatung Company,Tatung University
- Current Assignee: Tatung Company,Tatung University
- Current Assignee Address: TW Taipei TW Taipei
- Agency: J.C. Patents
- Priority: TW96150312A 20071226
- Main IPC: H01J1/62
- IPC: H01J1/62 ; H01J63/04

Abstract:
A method of fabricating a composite field emission source is provided. A first stage of film-forming process is performed by using RF magnetron sputtering, so as to form a nano structure film on a substrate, in which the nano structure film is a petal-like structure composed of a plurality of nano graphite walls. Afterward, a second stage of film-forming process is performed for increasing carbon accumulation amount on the nano structure film. Therefore, the composite field emission source with high strength and nano coral-like structures can be obtained, whereby improving the effect and life of electric field emission.
Public/Granted literature
- US20090167147A1 Composite field emission source and method of fabricating the same Public/Granted day:2009-07-02
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