发明授权
- 专利标题: Structure for phase change memory and the method of forming same
- 专利标题(中): 相变存储器的结构及其形成方法
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申请号: US11881077申请日: 2007-07-24
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公开(公告)号: US08084761B2公开(公告)日: 2011-12-27
- 发明人: Ming Hsiu Lee , Yi Chou Chen
- 申请人: Ming Hsiu Lee , Yi Chou Chen
- 申请人地址: TW Hsinchu
- 专利权人: Macronix International Co., Ltd.
- 当前专利权人: Macronix International Co., Ltd.
- 当前专利权人地址: TW Hsinchu
- 代理机构: Stout, Uxa, Buyan & Mullins, LLP
- 主分类号: H01L45/00
- IPC分类号: H01L45/00
摘要:
A phase change device includes a first contact electrode structure a phase change material and a first insulating material between the phase change material and the first contact electrode structure and a second contact electrode in contact with the phase change material. A contact structure formed in the first insulating material between the first contact electrode structure and the phase change material is also included. The contact structure is formed by an insulating material breakdown process. A method of forming a phase change device is also described.
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