发明授权
- 专利标题： Capacitor and method of manufacturing the same and capacitor unit
- 专利标题（中）： 电容器及其制造方法和电容器单元
-
申请号： US11819253申请日： 2007-06-26
-
公开(公告)号： US08085522B2公开(公告)日： 2011-12-27
- 发明人: Yoshitaka Sasaki , Tatsushi Shimizu , Takehiro Horinaka , Kazuo Ishizaki , Shigeki Tanemura
- 申请人： Yoshitaka Sasaki , Tatsushi Shimizu , Takehiro Horinaka , Kazuo Ishizaki , Shigeki Tanemura
- 申请人地址： US CA Milpitas CN Hong Kong
- 专利权人： Headway Technologies, Inc.,SAE Magnetics (H.K.) Ltd.
- 当前专利权人： Headway Technologies, Inc.,SAE Magnetics (H.K.) Ltd.
- 当前专利权人地址： US CA Milpitas CN Hong Kong
- 代理机构： Oliff & Berridge, PLC
- 主分类号： H01G4/005
- IPC分类号： H01G4/005 ; H01G4/06
摘要：
The present invention has a configuration which allows manufacturing a capacitor including a first electrode layer, conductive first convex sections layered on a surface of the first electrode layer, a first dielectric layer formed on a surface of the first convex sections and a surface of the first electrode layer, and a second electrode layer formed so as to be superimposed on the first convex sections and the first electrode layer via the first dielectric layer.
公开/授权文献
信息查询
