An electron beam apparatus 11 comprises a substrate 1, a first electrode wiring 2 formed on the substrate 1, an insulating layer 4 covering the first electrode wiring 2, a second electrode wiring 3 formed on the insulating layer 4 so as to cross the first electrode wiring 2, and on the substrate 1, an electron emitting device 6 located distant from an electrode wiring crossing region 9 where the first electrode wiring 2 and the second electrode wiring 3 cross each other, and connected to both the first electrode wiring 2 and the second electrode wiring 3 so as to receive drive energy from the first electrode wiring 2 and the second electrode wiring 3, wherein a void 5 is formed between the first electrode wiring 2 and the second electrode wiring 3 in at least a part of the electrode wiring crossing region 9.