Invention Grant
- Patent Title: Semiconductor quantum dot device
- Patent Title (中): 半导体量子点器件
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Application No.: US11640226Application Date: 2006-12-18
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Publication No.: US08106378B2Publication Date: 2012-01-31
- Inventor: Hideaki Saito
- Applicant: Hideaki Saito
- Applicant Address: JP Tokyo
- Assignee: NEC Corporation
- Current Assignee: NEC Corporation
- Current Assignee Address: JP Tokyo
- Agency: McGinn IP Law Group, PLLC
- Priority: JP2001-209208 20010710
- Main IPC: H01L29/06
- IPC: H01L29/06 ; H01L31/00

Abstract:
A p-type semiconductor barrier layer is provided in the vicinity of undoped quantum dots, and holes in the p-type semiconductor barrier layer are injected in advance in the ground level of the valence band of the quantum dots. Lowering the threshold electron density of conduction electrons in the ground level of the conduction band of quantum dots in this way accelerates the relaxation process of electrons from an excited level to the ground level in the conduction band.
Public/Granted literature
- US20070215857A1 Semiconductor quantum dot device Public/Granted day:2007-09-20
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