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US08107055B2 Substrate conveyance device and substrate conveyance method, exposure apparatus and exposure method, device manufacturing method 有权
基板输送装置及基板输送方法，曝光装置及曝光方法，装置的制造方法

Substrate conveyance device and substrate conveyance method, exposure apparatus and exposure method, device manufacturing method
摘要：
A method of pattern forming includes forming a resist film on a substrate, transferring a pattern onto the resist film by an immersion lithography method using a liquid immersion fluid to form a latent image on the resist film, conducting a first inspection to inspect whether or not the liquid immersion fluid remains on the resist film after said forming the latent image, developing the resist film after the first inspection, and performing predetermined processing when residual of the liquid immersion fluid is found in the first inspection.
摘要（中）：

图案形成的方法包括在基板上形成抗蚀剂膜，通过浸渍式光刻法使用液浸液将抗蚀剂图案转印到抗蚀膜上，在抗蚀剂膜上形成潜像，进行第一次检查，检查是否 在形成潜像之后，液浸液体保留在抗蚀剂膜上，在第一次检查之后显影抗蚀剂膜，并且在第一次检查中发现残留的液浸液体时进行预定处理。

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