发明授权
- 专利标题： Micromirror unit and method of making the same
- 专利标题（中）： 微镜单元及其制作方法
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申请号： US11480512申请日： 2006-07-05
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公开(公告)号： US08107157B2公开(公告)日： 2012-01-31
- 发明人: Osamu Tsuboi , Satoshi Ueda , Yoshihiro Mizuno , Ippei Sawaki , Fumio Yamagishi
- 申请人： Osamu Tsuboi , Satoshi Ueda , Yoshihiro Mizuno , Ippei Sawaki , Fumio Yamagishi
- 申请人地址： JP Kawasaki
- 专利权人： Fujitsu Limited
- 当前专利权人： Fujitsu Limited
- 当前专利权人地址： JP Kawasaki
- 代理机构： Murphy & King, P.C.
- 优先权： JP2001-129596 20010426
- 主分类号： G02B26/00
- IPC分类号： G02B26/00
摘要：
A method is provided for making a micromirror unit which includes a frame, a mirror forming base, and bridges connecting the frame to the mirror forming base. The method includes the following steps. First, a first mask pattern is formed on a substrate for masking portions of the substrate which are processed into the frame and the mirror forming base. Then, a second mask pattern is formed on the substrate for masking portions of the substrate which are processed into the bridges. Then, the substrate is subjected to a first etching process with the first and the second mask patterns present as masking means. Then, the second mask pattern is removed selectively. Then, the substrate is subjected to a second etching process with the first mask pattern present as masking means. Finally, the first mask pattern is removed.
公开/授权文献
- US20070091415A1 Micromirror unit and method of making the same 公开/授权日：2007-04-26