Invention Grant
- Patent Title: Method of manufacturing a process chamber component having yttrium-aluminum coating
- Patent Title (中): 制造具有钇铝涂层的处理室部件的方法
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Application No.: US11982039Application Date: 2007-10-31
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Publication No.: US08110086B2Publication Date: 2012-02-07
- Inventor: Nianci Han , Li Xu , Hong Shih
- Applicant: Nianci Han , Li Xu , Hong Shih
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Janah & Associates, P.C.
- Agent Ashok K. Janah
- Main IPC: C25D11/04
- IPC: C25D11/04
Abstract:
A method of manufacturing a substrate processing chamber component comprises forming a chamber component comprising a metal alloy comprising yttrium and aluminum, and anodizing an exposed surface of the metal alloy.
Public/Granted literature
- US20080110760A1 Process chamber component having yttrium-aluminum coating Public/Granted day:2008-05-15
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