发明授权
- 专利标题： Metal photoetching product and production method thereof
- 专利标题（中）： 金属光刻产品及其制备方法
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申请号： US12292759申请日： 2008-11-25
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公开(公告)号： US08110344B2公开(公告)日： 2012-02-07
- 发明人: Ryuji Ueda , Satoshi Tanaka , Osamu Koga , Fusao Takagi , Hiroshi Matsuzawa , Yusuke Onoda , Shingo Akao
- 申请人： Ryuji Ueda , Satoshi Tanaka , Osamu Koga , Fusao Takagi , Hiroshi Matsuzawa , Yusuke Onoda , Shingo Akao
- 申请人地址： JP Tokyo
- 专利权人： Toppan Printing Co., Ltd.
- 当前专利权人： Toppan Printing Co., Ltd.
- 当前专利权人地址： JP Tokyo
- 优先权： JPP2003-009237 20030117
- 主分类号： C03C25/68
- IPC分类号： C03C25/68 ; G03F7/20
摘要：
A metal photoetching product comprising at least one large cavity of minor axis W1S, major axis W1L and depth D1 in a surface of the product, wherein one or more cavities are included inside at least one of the at least one large cavity, and a smallest hole among the cavities has minor axis of W2S, major axis W2L, and depth D2; and the product satisfies the following dimensions, D1+D2=plate thickness D, 0.02 mm≦D≦2 mm, 0.4×D
公开/授权文献
- US20090081596A1 Metal photoetching product and production method thereof 公开/授权日：2009-03-26
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