发明授权
US08111725B2 Surface-emitting laser, surface-emitting laser array, optical scanning device, and image forming apparatus
有权
表面发射激光器,表面发射激光器阵列,光学扫描装置和成像装置
- 专利标题: Surface-emitting laser, surface-emitting laser array, optical scanning device, and image forming apparatus
- 专利标题(中): 表面发射激光器,表面发射激光器阵列,光学扫描装置和成像装置
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申请号: US12464408申请日: 2009-05-12
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公开(公告)号: US08111725B2公开(公告)日: 2012-02-07
- 发明人: Toshihiro Ishii , Kengo Makita , Naoto Jikutani , Kazuhiro Harasaka , Shunichi Sato , Satoru Sugawara
- 申请人: Toshihiro Ishii , Kengo Makita , Naoto Jikutani , Kazuhiro Harasaka , Shunichi Sato , Satoru Sugawara
- 申请人地址: JP Tokyo
- 专利权人: Ricoh Company, Ltd.
- 当前专利权人: Ricoh Company, Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Cooper & Dunham LLP
- 优先权: JP2008-125709 20080513; JP2009-081678 20090330
- 主分类号: H01S5/00
- IPC分类号: H01S5/00
摘要:
A disclosed surface-emitting laser includes a substrate and multiple semiconductor layers stacked on the substrate. A normal of the principal plane of the substrate is inclined with respect to one of crystal orientations toward one of crystal orientations . The semiconductor layers include a resonator structure including an active layer; and a semiconductor multilayer mirror stacked on the resonator structure. The semiconductor multilayer mirror includes a confined structure where a current passage area is surrounded by an oxidized area including at least an oxide generated by oxidation of a part of a selective oxidation layer containing aluminum. A strain field caused by the oxidation is present at least in a part of the vicinity of the oxidized area. In the strain field, the amount of strain in a first axis direction is different from the amount of strain in a second axis direction.
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