发明授权
- 专利标题: Implant retention device and method
- 专利标题(中): 植入物保留装置及方法
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申请号: US11963496申请日: 2007-12-21
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公开(公告)号: US08114160B2公开(公告)日: 2012-02-14
- 发明人: Brian P. Janowski , Qi-Bin Bao , Thomas S. Kilpela , Jeffrey L. Trudeau
- 申请人: Brian P. Janowski , Qi-Bin Bao , Thomas S. Kilpela , Jeffrey L. Trudeau
- 申请人地址: US MI Marquette
- 专利权人: Pioneer Surgical Technology, Inc.
- 当前专利权人: Pioneer Surgical Technology, Inc.
- 当前专利权人地址: US MI Marquette
- 代理机构: Fitch, Even, Tabin & Flannery
- 主分类号: A61F2/44
- IPC分类号: A61F2/44
摘要:
An implant retention device is provided to assist in restraining movement of a nuclear implant and to assist in preventing expulsion of the nuclear implant through an incision portal or defect in the annular wall. In one form, the implant retention device comprises an expulsion prevention member associated with the nuclear implant and is configured to transition between an unexpanded position and an expanded position. In another form, a method for restraining a nuclear implant includes cutting an opening in the annulus, shifting an implant retention device into an unexpanded position, inserting the implant retention device through the opening, and shifting the retention device to an expanded position.
公开/授权文献
- US20080154263A1 Implant Retention Device and Method 公开/授权日:2008-06-26
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