Invention Grant
- Patent Title: Semiconductor single crystal growth method having improvement in oxygen concentration characteristics
- Patent Title (中): 具有氧浓度特性改善的半导体单晶生长方法
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Application No.: US12263000Application Date: 2008-10-31
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Publication No.: US08114216B2Publication Date: 2012-02-14
- Inventor: Hyon-Jong Cho , Seung-Ho Shin , Ji-Hun Moon , Hong-Woo Lee , Young-Ho Hong
- Applicant: Hyon-Jong Cho , Seung-Ho Shin , Ji-Hun Moon , Hong-Woo Lee , Young-Ho Hong
- Applicant Address: KR Gumi
- Assignee: Siltron, Inc.
- Current Assignee: Siltron, Inc.
- Current Assignee Address: KR Gumi
- Agency: Greer, Burns & Crain, Ltd.
- Priority: KR10-2007-0111339 20071102
- Main IPC: C30B15/00
- IPC: C30B15/00

Abstract:
The present invention relates to a semiconductor single crystal growth method, which uses a Czochralski process for growing a semiconductor single crystal through a solid-liquid interface by dipping a seed into a semiconductor melt received in a quartz crucible and pulling up the seed while rotating the quartz crucible and applying a strong horizontal magnetic field, wherein the seed is pulled up while the quartz crucible is rotated with a rate between 0.6 rpm and 1.5 rpm.
Public/Granted literature
- US20090114147A1 SEMICONDUCTOR SINGLE CRYSTAL GROWTH METHOD HAVING IMPROVEMENT IN OXYGEN CONCENTRATION CHARACTERISTICS Public/Granted day:2009-05-07
Information query
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