Invention Grant
- Patent Title: Phosphorus-containing benzoxazine resin with various substituents and method for preparing the same
- Patent Title (中): 含各种取代基的含磷苯并恶嗪树脂及其制备方法
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Application No.: US12710623Application Date: 2010-02-23
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Publication No.: US08114988B2Publication Date: 2012-02-14
- Inventor: Wen-Chiung Su , Ching-Hsuan Lin , Po-Wen Cheng
- Applicant: Wen-Chiung Su , Ching-Hsuan Lin , Po-Wen Cheng
- Applicant Address: TW Taoyuan County
- Assignee: Chung-Shan Institute of Science and Technology, Armaments Bureau, Ministry of National Defense
- Current Assignee: Chung-Shan Institute of Science and Technology, Armaments Bureau, Ministry of National Defense
- Current Assignee Address: TW Taoyuan County
- Main IPC: C08G79/04
- IPC: C08G79/04
Abstract:
The present invention provides a method for preparing a phosphorus-containing bexzoxazine resin having the following structure shown as the formula (I) or (V): wherein, R1˜R4 respectively comprise one selected from the group consisting of hydrogen, C1˜C6 alkyl, C3˜C6 cyclic alkyl, and phenyl.
Public/Granted literature
- US20110207908A1 PHOSPHORUS-CONTAINING BEXZOXAZINE RESIN WITH VARIOUS SUBSTITUENTS AND METHOD FOR PREPARING THE SAME Public/Granted day:2011-08-25
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