发明授权
- 专利标题: Gas field ion source, charged particle microscope, and apparatus
- 专利标题(中): 气体离子源,带电粒子显微镜和装置
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申请号: US12318583申请日: 2008-12-31
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公开(公告)号: US08115184B2公开(公告)日: 2012-02-14
- 发明人: Hiroyasu Shichi , Shinichi Matsubara , Takashi Ohshima , Satoshi Tomimatsu , Tomihiro Hashizume , Tohru Ishitani
- 申请人: Hiroyasu Shichi , Shinichi Matsubara , Takashi Ohshima , Satoshi Tomimatsu , Tomihiro Hashizume , Tohru Ishitani
- 申请人地址: JP Tokyo
- 专利权人: Hitachi High-Technologies Corporation
- 当前专利权人: Hitachi High-Technologies Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Stites & Harbison PLLC
- 代理商 Juan Carlos A. Marquez, Esq.
- 优先权: JP2008-000477 20080107
- 主分类号: H01J49/00
- IPC分类号: H01J49/00
摘要:
A gas field ion source that can simultaneously increase a conductance during rough vacuuming and reduce an extraction electrode aperture diameter from the viewpoint of the increase of ion current. The gas field ion source has a mechanism to change a conductance in vacuuming a gas molecule ionization chamber. That is, the conductance in vacuuming a gas molecule ionization chamber is changed in accordance with whether or not an ion beam is extracted from the gas molecule ionization chamber. By forming lids as parts of the members constituting the mechanism to change the conductance with a bimetal alloy, the conductance can be changed in accordance with the temperature of the gas molecule ionization chamber, for example the conductance is changed to a relatively small conductance at a relatively low temperature and to a relatively large conductance at a relatively high temperature.
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