发明授权
- 专利标题： Inspection method and apparatus, lithographic apparatus, lithographic processing cell, and device manufacturing method to measure a property of a substrate
- 专利标题（中）： 检测方法和装置，光刻设备，光刻处理单元和测量基板性质的器件制造方法
-
申请号： US12256780申请日： 2008-10-23
-
公开(公告)号： US08115926B2公开(公告)日： 2012-02-14
- 发明人: Alexander Straaijer
- 申请人： Alexander Straaijer
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Sterne, Kessler, Goldstein & Fox P.L.L.C
- 主分类号： G01J4/00
- IPC分类号： G01J4/00
摘要：
A system is configured to measure two separately polarized beams upon diffraction from a substrate in order to determine properties of the substrate. Circularly or elliptically polarized light sources are passed via a fixed phase retarder in order to change the phase of one of two orthogonally polarized radiation beams with respect to the two beams. The relative phases of the two radiation beams and other features of the beams are measured in a detector to provide information on the properties of the substrate surface.
公开/授权文献
信息查询
